Height stabilization of GaSb/GaAs quantum dots by Al-rich capping
Author(s) -
E. P. Smakman,
Matt DeJarld,
Marta Luengo-Kovac,
A. J. Martin,
Vanessa Sih,
P. M. Koenraad,
J. Mirecki Millunchick
Publication year - 2014
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4895783
Subject(s) - quantum dot , photoluminescence , materials science , molecular beam epitaxy , scanning tunneling microscope , stacking , optoelectronics , dislocation , quantum tunnelling , layer (electronics) , epitaxy , nanotechnology , chemistry , composite material , organic chemistry
GaSb quantum dots (QDs) in a GaAs matrix are investigated with cross-sectional scanning tunneling microscopy (X-STM) and photoluminescence (PL). We observe that Al-rich capping materials prevent destabilization of the nanostructures during the capping stage of the molecular beam epitaxy (MBE) growth process and thus preserves the QD height. However, the strain induced by the absence of destabilization causes many structural defects to appear around the preserved QDs. These defects originate from misfit dislocations near the GaSb/GaAs interface and extend into the capping layer as stacking faults. The lack of a red shift in the QD PL suggests that the preserved dots do not contribute to the emission spectra. We suggest that a better control over the emission wavelength and an increase of the PL intensity is attainable by growing smaller QDs with an Al-rich overgrowth.
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