Determination of the density of the defect states in Hf0.5Zr0.5O2 high-k film Deposited by using rf-magnetron sputtering technique | Zendy

W. Lu | Zendy; JianXin Lu | Zendy; Xiaoxia Ou | Zendy; X. J. Liu | Zendy; Yanqiang Cao | Zendy; A. D. Li | Zendy; Bin Xu | Zendy; Yidong Xia | Zendy; Jiang Yin | Zendy; Z. G. Liu | Zendy

Open Access

Determination of the density of the defect states in Hf0.5Zr0.5O2 high-k film Deposited by using rf-magnetron sputtering technique

Author(s) -

W. Lu,

JianXin Lu,

Xiaoxia Ou,

X. J. Liu,

Yanqiang Cao,

A. D. Li,

Bin Xu,

Yidong Xia,

Jiang Yin,

Z. G. Liu

Publication year - 2014

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4892857

Subject(s) - high resolution transmission electron microscopy , materials science , sputter deposition , annealing (glass) , capacitance , microstructure , transmission electron microscopy , atomic layer deposition , sputtering , cavity magnetron , high power impulse magnetron sputtering , planar , electron density , optoelectronics , analytical chemistry (journal) , thin film , electron , nanotechnology , chemistry , electrode , metallurgy , chromatography , computer graphics (images) , physics , quantum mechanics , computer science

A memory structure Pt/Al2O3/Hf0.5Zr0.5O2/Al2O3/p-Si was fabricated by using atomic layer deposition and rf-magnetron sputtering techniques, and its microstructure has been investigated by using the high resolution transmission electron microscopy (HRTEM). By measuring the applied gate voltage dependence of the capacitance for the memory structure, the planar density of the trapped charges in Hf0.5Zr0.5O2 high-k film was estimated as 6.63 × 1012 cm−2, indicating a body defect density of larger than 2.21 × 1019 cm−3. It is observed that the post-annealing in N2 can reduces the defect density in Hf0.5Zr0.5O2 film, which was ascribed to the occupancy of oxygen vacancies by nitrogen atoms

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research