Open AccessEpitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces
Author(s) -
Patricia de Coux,
Romain Bachelet,
B. Warot-Fonrose,
V. Skumryev,
L. Lupina,
Gang Niu,
Thomas Schroeder,
J. Fontcuberta,
F. Sánchez
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4887349
Subject(s) - ferromagnetism , epitaxy , materials science , amorphous solid , silicon , layer (electronics) , oxide , optoelectronics , condensed matter physics , nanotechnology , crystallography , chemistry , metallurgy , physics
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