Open AccessThe impact of argon admixture on the c-axis oriented growth of direct current magnetron sputtered ScxAl1−xN thin films
Author(s) -
P. M. Mayrhofer,
C. EisenmengerSittner,
Michael StögerPollach,
Holger Euchner,
Achim Bittner,
U. Schmid
Publication year - 2014
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4876260
Subject(s) - wurtzite crystal structure , materials science , sputter deposition , thin film , sputtering , scanning electron microscope , argon , microstructure , analytical chemistry (journal) , transmission electron microscopy , lattice constant , nitride , grain size , diffraction , composite material , metallurgy , nanotechnology , optics , chemistry , physics , organic chemistry , chromatography , layer (electronics) , zinc
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom