On the reliable analysis of indium mole fraction within InxGa1−xN quantum wells using atom probe tomography
Author(s) -
James R. Riley,
Theeradetch Detchprohm,
Christian Wetzel,
Lincoln J. Lauhon
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4871510
Subject(s) - atom probe , quantum well , indium , crystal (programming language) , atom (system on chip) , mole fraction , evaporation , ion , plane (geometry) , materials science , atomic physics , molecular physics , chemistry , physics , crystallography , optics , geometry , microstructure , optoelectronics , quantum mechanics , embedded system , laser , computer science , programming language , mathematics , thermodynamics
Surface crystallography and polarity are shown to influence the detection probability of In, Ga, and N ions during atom probe tomography analysis of InxGa1−xN m-plane, c-plane, and (202¯1¯) quantum wells. A N deficit is observed in regions of the reconstruction generated from Ga-polar surfaces, and the probability of detecting group-III atoms is lower in InxGa1−xN quantum wells than in GaN barrier layers. Despite these artifacts, the detected In mole fraction is consistent throughout a given quantum well regardless of the crystal orientation of the quantum well or the evaporation surface from which the reconstruction was generated.
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