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Anisotropy in the hole mobility measured along the [110] and [1¯10] orientations in a strained Ge quantum well
Author(s) -
A. H. A. Hassan,
R. J. H. Morris,
O. A. Mironov,
Richard Beanland,
David Walker,
Steven Huband,
A. Dobbie,
M. Myronov,
D. R. Leadley
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4870392
Subject(s) - anisotropy , materials science , germanium , condensed matter physics , scattering , electron mobility , relaxation (psychology) , transmission electron microscopy , electrical resistivity and conductivity , wafer , quantum well , diffraction , surface roughness , surface finish , silicon , optics , optoelectronics , physics , nanotechnology , quantum mechanics , psychology , social psychology , laser , composite material

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