Dramatically enhanced self-assembly of GeSi quantum dots with superior photoluminescence induced by the substrate misorientation
Author(s) -
Tong Zhou,
Zhenyang Zhong
Publication year - 2014
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4866356
Subject(s) - materials science , vicinal , photoluminescence , quantum dot , wetting layer , misorientation , substrate (aquarium) , kinetics , exciton , wetting , optoelectronics , layer (electronics) , nanotechnology , condensed matter physics , chemical physics , microstructure , chemistry , composite material , grain boundary , oceanography , organic chemistry , physics , quantum mechanics , geology
A dramatically enhanced self-assembly of GeSi quantum dots (QDs) is disclosed on slightly miscut Si (001) substrates, leading to extremely dense QDs and even a growth mode transition. The inherent mechanism is addressed in combination of the thermodynamics and the growth kinetics both affected by steps on the vicinal surface. Moreover, temperature-dependent photoluminescence spectra from dense GeSi QDs on the miscut substrate demonstrate a rather strong peak persistent up to 300 K, which is attributed to the well confinement of excitons in the dense GeSi QDs due to the absence of the wetting layer on the miscut substrate
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