Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films | Zendy

Hideto Yanagihara | Zendy; Y Utsumi | Zendy; Tomohiko Niizeki | Zendy; Jun-ichiro Inoue | Zendy; Eiji Kita | Zendy

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Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

Author(s) -

Hideto Yanagihara,

Y Utsumi,

Tomohiko Niizeki,

Jun-ichiro Inoue,

Eiji Kita

Publication year - 2014

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.4864048

Subject(s) - materials science , magnetic anisotropy , condensed matter physics , epitaxy , magnetization , sputtering , sputter deposition , thin film , anisotropy , electron diffraction , film plane , layer (electronics) , diffraction , composite material , magnetic field , optics , nanotechnology , physics , quantum mechanics

We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of Co x Fe3– x O4(001) epitaxial films (x = 0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant Ku are strongly dependent on the reactive gas (O2) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co x Fe3– x O4 epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface

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