Open AccessIntrinsic magnetic properties of hexagonal LuFeO3 and the effects of nonstoichiometry
Author(s) -
Jarrett A. Moyer,
R. N. Misra,
Julia A. Mundy,
Charles M. Brooks,
John T. Heron,
David A. Muller,
Darrell G. Schlom,
P. Schiffer
Publication year - 2014
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4861795
Subject(s) - stoichiometry , lutetium , materials science , molecular beam epitaxy , analytical chemistry (journal) , transmission electron microscopy , scanning electron microscope , magnetometer , diffraction , oxide , crystallography , epitaxy , magnetic field , nanotechnology , chemistry , optics , metallurgy , yttrium , physics , layer (electronics) , chromatography , quantum mechanics , composite material
We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO3 (h-LuFeO3) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO3 to have a TN = 147 K and Ms = 0.018 μB/Fe
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