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Adsorption-controlled growth of BiVO4 by molecular-beam epitaxy
Author(s) -
Stephanie Stoughton,
M. Showak,
QinSheng Mao,
Prakash Koirala,
Daniel Hillsberry,
Shawn Sallis,
Lena F. Kourkoutis,
Khai V. Nguyen,
Louis F. J. Piper,
D. A. Ténné,
Nikolas J. Podraza,
David A. Muller,
Carolina Adamo,
Darrell G. Schlom
Publication year - 2013
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4824041
Subject(s) - materials science , monoclinic crystal system , molecular beam epitaxy , epitaxy , raman spectroscopy , yttria stabilized zirconia , cubic zirconia , electron diffraction , spectroscopy , scanning transmission electron microscopy , transmission electron microscopy , analytical chemistry (journal) , electron energy loss spectroscopy , crystallography , diffraction , nanotechnology , optics , crystal structure , chemistry , organic chemistry , metallurgy , ceramic , physics , quantum mechanics , layer (electronics)
Single-phase epitaxial films of the monoclinic polymorph of BiVO4 were synthesized by reactive molecular-beam epitaxy under adsorption-controlled conditions. The BiVO4 films were grown on (001) yttria-stabilized cubic zirconia (YSZ) substrates. Four-circle x-ray diffraction, scanning transmission electron microscopy (STEM), and Raman spectroscopy confirm the epitaxial growth of monoclinic BiVO4 with an atomically abrupt interface and orientation relationship (001)BiVO4 ∥ (001)YSZ with [100]BiVO4 ∥ [100]YSZ. Spectroscopic ellipsometry, STEM electron energy loss spectroscopy (STEM-EELS), and x-ray absorption spectroscopy indicate that the films have a direct band gap of 2.5 ± 0.1 eV

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