Minority anion substitution by Ni in ZnO
Author(s) -
L. M. C. Pereira,
U. Wahl,
J. G. Correia,
L. M. Amorim,
D. J. Silva,
E. David-Bosne,
S. Decoster,
M. R. da Silva,
K. Temst,
A. Vantomme
Publication year - 2013
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4820254
Subject(s) - dopant , magnetic semiconductor , doping , ion , materials science , semiconductor , lattice (music) , transition metal , substitution (logic) , crystallography , zinc , wide bandgap semiconductor , condensed matter physics , inorganic chemistry , chemical physics , chemistry , metallurgy , physics , optoelectronics , catalysis , biochemistry , organic chemistry , computer science , acoustics , programming language
We report on the lattice location of implanted Ni in ZnO using the beta(-) emission channeling technique. In addition to the majority substituting for the cation (Zn), a significant fraction of the Ni atoms occupy anion (O) sites. Since Ni is chemically more similar to Zn than it is to O, the observed O substitution is rather puzzling. We discuss these findings with respect to the general understanding of lattice location of dopants in compound semiconductors. In particular, we discuss potential implications on the magnetic behavior of transition metal doped dilute magnetic semiconductors. (C) 2013 AIP Publishing LLC
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