Photoinduced reorientation and polarization holography in a new photopolymer with 4-methoxy-N-benzylideneaniline side groups | Zendy

Nobuhiro Kawatsuki | Zendy; Hitomi Matsushita | Zendy; Mizuho Kondo | Zendy; Tomoyuki Sasaki | Zendy; Hiroshi Ono | Zendy

Open Access

Photoinduced reorientation and polarization holography in a new photopolymer with 4-methoxy-N-benzylideneaniline side groups

Author(s) -

Nobuhiro Kawatsuki,

Hitomi Matsushita,

Mizuho Kondo,

Tomoyuki Sasaki,

Hiroshi Ono

Publication year - 2013

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.4818003

Subject(s) - holography , materials science , birefringence , polarization (electrochemistry) , polymer , photopolymer , photochemistry , polarization microscopy , optics , irradiation , laser , optoelectronics , polymerization , microscopy , chemistry , composite material , physics , nuclear physics

The photoinduced reorientation and surface relief (SR) formation behaviors of a novel photosensitive polymer, which was transparent in visible region, were investigated using linearly polarized-313-nm light and holographic exposure with a 325-nm He-Cd laser. The polymer was comprised of photosensitive 4-methoxy-N-benzylideneaniline side groups, and exhibited a sufficient photoinduced molecular reorientation with a birefringence of 0.11. Holographic exposure generated a SR structure, which had a periodical molecular reorientation that depended on the polarization of the interference beams. The generated SR height was ∼212 nm, and the inscription of a double holographic exposure yielded a two-dimensional SR structure

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