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Electrical injection Ga(AsBi)/(AlGa)As single quantum well laser
Author(s) -
Peter Ludewig,
Nikolai Knaub,
N. Hossain,
S. Reinhard,
L. Nattermann,
Igor P. Marko,
S. R. Jin,
K. Hild,
Sangam Chatterjee,
W. Stolz,
Stephen J. Sweeney,
Kerstin Volz
Publication year - 2013
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4811736
Subject(s) - optoelectronics , materials science , lasing threshold , laser , quantum well , diode , semiconductor laser theory , gain switching , wavelength , infrared , epitaxy , optics , nanotechnology , layer (electronics) , physics
The Ga(AsBi) material system opens opportunities in the field of high efficiency infrared laser diodes. We report on the growth, structural investigations, and lasing properties of dilute bismide Ga(AsBi)/(AlGa)As single quantum well lasers with 2.2% Bi grown by metal organic vapor phase epitaxy on GaAs (001) substrates. Electrically injected laser operation at room temperature is achieved with a threshold current density of 1.56 kA/cm2 at an emission wavelength of ∼947 nm. These results from broad area devices show great promise for developing efficient IR laser diodes based on this emerging materials system.

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