Hydrogen termination of CVD diamond films by high-temperature annealing at atmospheric pressure | Zendy

V. Seshan | Zendy; D. Ullien | Zendy; Andrés Castellanos-Gómez | Zendy; Sumit Sachdeva | Zendy; Dharmapura H. K. Murthy | Zendy; Tom J. Savenije | Zendy; Hakeem Abrar Ahmad | Zendy; Tim Nunney | Zendy; Stoffel D. Janssens | Zendy; Ken Haenen | Zendy; Miloš Nesládek | Zendy; Herre S. J. van der Zant | Zendy; E.J.R. Sudhölter | Zendy; Louis C. P. M. de Smet | Zendy

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Hydrogen termination of CVD diamond films by high-temperature annealing at atmospheric pressure

Author(s) -

V. Seshan,

D. Ullien,

Andrés Castellanos-Gómez,

Sumit Sachdeva,

Dharmapura H. K. Murthy,

Tom J. Savenije,

Hakeem Abrar Ahmad,

Tim Nunney,

Stoffel D. Janssens,

Ken Haenen,

Miloš Nesládek,

Herre S. J. van der Zant,

E.J.R. Sudhölter,

Louis C. P. M. de Smet

Publication year - 2013

Publication title -

the journal of chemical physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.071

H-Index - 357

eISSN - 1089-7690

pISSN - 0021-9606

DOI - 10.1063/1.4810866

Subject(s) - diamond , chemical vapor deposition , dangling bond , annealing (glass) , hydrogen , carbon film , wetting , materials science , chemical engineering , carbon fibers , atmospheric pressure , material properties of diamond , chemistry , nanotechnology , analytical chemistry (journal) , thin film , composite material , organic chemistry , composite number , oceanography , geology , engineering

A high-temperature procedure to hydrogenate diamond films using molecular hydrogen at atmospheric pressure was explored. Undoped and doped chemical vapour deposited (CVD) polycrystalline diamond films were treated according to our annealing method using a H2 gas flow down to ?50 ml/min (STP) at ?850?°C. The films were extensively evaluated by surface wettability, electron affinity, elemental composition, photoconductivity, and redox studies. In addition, electrografting experiments were performed. The surface characteristics as well as the optoelectronic and redox properties of the annealed films were found to be very similar to hydrogen plasma-treated films. Moreover, the presented method is compatible with atmospheric pressure and provides a low-cost solution to hydrogenate CVD diamond, which makes it interesting for industrial applications. The plausible mechanism for the hydrogen termination of CVD diamond films is based on the formation of surface carbon dangling bonds and carbon-carbon unsaturated bonds at the applied tempera-ture, which react with molecular hydrogen to produce a hydrogen-terminated surface

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