High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering | Zendy

Aritra Dhar | Zendy; T. L. Alford | Zendy

Open Access

High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

Author(s) -

Aritra Dhar,

T. L. Alford

Publication year - 2013

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.4808438

Subject(s) - materials science , sputtering , sheet resistance , transmittance , figure of merit , electrode , substrate (aquarium) , indium , composite number , layer (electronics) , optoelectronics , sputter deposition , composite material , transparent conducting film , thin film , nanotechnology , chemistry , oceanography , geology

Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10−3 Ω−1/sq

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