Open AccessLow-temperature crystallization of high performance Pb0.4Sr0.6TiO3 films compatible with the current silicon-based microelectronic technology
Author(s) -
Kui Li,
Denis Rémiens,
Xianlin Dong,
Jean Costecalde,
Nossikpendou Sama,
Tao Li,
Gang Du,
Ying Chen,
Genshui Wang
Publication year - 2013
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4807792
Subject(s) - materials science , microelectronics , crystallization , dielectric , crystallinity , thin film , optoelectronics , silicon , figure of merit , sputtering , ferroelectricity , composite material , chemical engineering , nanotechnology , engineering
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