Rate-limiting processes in the fast SET operation of a gapless-type Cu-Ta2O5 atomic switch
Author(s) -
Tohru Tsuruoka,
Tsuyoshi Hasegawa,
Ilia Valov,
Rainer Waser,
Masakazu Aono
Publication year - 2013
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4795140
Subject(s) - gapless playback , nucleation , materials science , limiting , voltage , pulse (music) , oxide , electrode , transient (computer programming) , switching time , amplitude , optoelectronics , atomic physics , analytical chemistry (journal) , chemistry , condensed matter physics , electrical engineering , physics , computer science , metallurgy , optics , mechanical engineering , chromatography , engineering , operating system , organic chemistry
The speed of the SET operation of a Cu/Ta2O5/Pt atomic switch from a high-resistance state to a low-resistance state was measured by transient current measurements under the application of a short voltage pulse. The SET time decreased exponentially with increasing pulse amplitude, reaching as low as 1 ns using moderate pulse voltages. This observation shows that oxide-based atomic switches hold potential for fast-switching memory applications. From a comparison with atomistic nucleation theory, Cu nucleation on the Pt electrode was found to be the likely rate-limiting process determining the SET time.
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