Open AccessWork function and electron affinity of the fluorine-terminated (100) diamond surface
Author(s) -
Kevin J. Rietwyk,
Swee Liang Wong,
Liang Cao,
Kane M. O’Donnell,
L. Ley,
Andrew T. S. Wee,
C. I. Pakes
Publication year - 2013
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4793999
Subject(s) - work function , electron affinity (data page) , diamond , fermi level , fluorine , vacuum level , annealing (glass) , atomic physics , electron , chemistry , analytical chemistry (journal) , density functional theory , synchrotron , materials science , computational chemistry , electrode , optics , physics , molecule , metallurgy , organic chemistry , quantum mechanics , chromatography
The work function and electron affinity of fluorine-terminated (100) diamond surfaces prepared by exposure to dissociated XeF2 have been determined using synchrotron-based photoemission. After vacuum annealing to 350 °C a clean, monofluoride terminated C(100):F surface was obtained for which an electron affinity of 2.56 eV was measured. This is the highest electron affinity reported for any diamond surface termination so far, and it exceeds the value predicted by recent density functional theory calculations by 0.43 eV. The work function of 7.24 eV measured for the same surface places the Fermi energy of 0.79 eV above the valence band maximum.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom