Open AccessDesign considerations for tailoring the thickness profile of transparent dielectric deposits by continuous-wave laser deposition
Author(s) -
J.M. González-Leal,
J. Valverde
Publication year - 2013
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4773332
Subject(s) - chalcogenide , dielectric , materials science , fabrication , chalcogenide glass , laser , planar , substrate (aquarium) , optics , deposition (geology) , infrared , continuous wave , optoelectronics , refractive index , intensity (physics) , thin film , nanotechnology , medicine , paleontology , oceanography , alternative medicine , physics , computer graphics (images) , pathology , sediment , computer science , biology , geology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom