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Direct observation of substitutional Ga after ion implantation in Ge by means of extended x-ray absorption fine structure
Author(s) -
S. Decoster,
Bernt Johannessen,
C. J. Glover,
Stefaan Cottenier,
T. Bierschenk,
Hazar A. Salama,
Felipe Kremer,
K. Temst,
A. Vantomme,
M. C. Ridgway
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4773185
Subject(s) - extended x ray absorption fine structure , ion implantation , bond length , ion , dopant , materials science , annealing (glass) , lattice (music) , density functional theory , crystallography , analytical chemistry (journal) , atomic physics , crystal structure , doping , chemistry , absorption spectroscopy , computational chemistry , optics , optoelectronics , physics , organic chemistry , chromatography , acoustics , composite material
We acknowledge the support from the Research Foundation Flanders, the epi-team from imec, the KU Leuven GOA 09/06 project, the IUAP program P6/42 and the Australian Research Council. S.C. acknowledges support from OCAS NV by an OCAS-endowed chair at Ghent University.

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