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Intense terahertz emission from molecular beam epitaxy-grown GaAs/GaSb(001)
Author(s) -
Cyril Sadia,
Aleena Maria Laganapan,
Mae Agatha Tumanguil,
Elmer Estacio,
Armando Somintac,
Arnel Salvador,
Christopher T. Que,
Kohji Yamamoto,
Masahiko Tani
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4770267
Subject(s) - terahertz radiation , molecular beam epitaxy , materials science , heterojunction , optoelectronics , gallium arsenide , epitaxy , electric field , thin film , substrate (aquarium) , nanotechnology , layer (electronics) , physics , oceanography , quantum mechanics , geology
Intense terahertz (THz) electromagnetic wave emission was observed in undoped GaAs thin films deposited on (100) n-GaSb substrates via molecular beam epitaxy. GaAs/n-GaSb heterostructures were found to be viable THz sources having signal amplitude 75% that of bulk p-InAs. The GaAs films were grown by interruption method during the growth initiation and using various metamorphic buffer layers. Reciprocal space maps revealed that the GaAs epilayers are tensile relaxed. Defects at the i-GaAs/n-GaSb interface were confirmed by scanning electron microscope images. Band calculations were performed to infer the depletion region and electric field at the i-GaAs/n-GaSb and the air-GaAs interfaces. However, the resulting band calculations were found to be insufficient to explain the THz emission. The enhanced THz emission is currently attributed to a piezoelectric field induced by incoherent strain and defects.

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