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Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films
Author(s) -
Rui Guo,
Lü You,
M. Motapothula,
Zhen Zhang,
Mark B. H. Breese,
Lang Chen,
Di Wu,
Junling Wang
Publication year - 2012
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4757938
Subject(s) - pulsed laser deposition , substrate (aquarium) , materials science , deposition (geology) , thin film , composition (language) , domain (mathematical analysis) , field (mathematics) , chemical engineering , analytical chemistry (journal) , nanotechnology , chemistry , geology , environmental chemistry , pure mathematics , paleontology , mathematical analysis , philosophy , mathematics , sediment , engineering , oceanography , linguistics
Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a combination of interface effect and defect induced internal field causes this evolution

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