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We report on large-distance rf-magnetron sputtering as a competitive alternative to pulsed laser deposition and off-axis sputtering for the growth of epitaxial PbZr0.52Ti0.48O3 (PZT) thin films. To determine the characteristics of the PZT films, the studies were focused on the interplay between microstructural and ferroelectric properties. The films were deposited on insulating or conducting (Nb-doped) SrTiO3 and MgO substrates with La0.83Sr0.17MnO3 as bottom electrode. The uniformity and homogeneity of the samples was demonstrated by using large area (1.0 mm2) top electrodes. It is shown that epitaxial heterostructures of excellent crystalline and ferroelectric quality can be deposited from a stoichiometric PZT target without the need for excess PbO in the target or post-annealing of the samples

Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures