Open AccessSpectroscopic analysis of Al and N diffusion in HfO2
Author(s) -
Patrick Lysaght,
J. C. Woicik,
M. Alper Sahiner,
J. Price,
Conan Weiland,
P. D. Kirsch
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4754578
Subject(s) - x ray photoelectron spectroscopy , microstructure , materials science , analytical chemistry (journal) , annealing (glass) , diffusion , thin film , spectroscopy , chemistry , chemical engineering , metallurgy , nanotechnology , engineering , physics , chromatography , quantum mechanics , thermodynamics
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