Open AccessPlasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
Author(s) -
Xianzong Xie,
Loren Rieth,
Srinivas Merugu,
Prashant Tathireddy,
Florian Solzbacher
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4748322
Subject(s) - atomic layer deposition , materials science , encapsulation (networking) , parylene , nanotechnology , layer (electronics) , electronics , plasma , optoelectronics , composite material , polymer , chemistry , physics , computer network , quantum mechanics , computer science
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