Phase change behaviors of Zn-doped Ge2Sb2Te5 films
Author(s) -
Guoxiang Wang,
Qiuhua Nie,
Xiang Shen,
Rongping Wang,
Liangcai Wu,
Jing Fu,
Tiefeng Xu,
Shixun Dai
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4742144
Subject(s) - crystallization , materials science , doping , phase (matter) , crystallography , thermal stability , atom (system on chip) , hexagonal crystal system , phase change memory , phase change , band gap , hexagonal phase , germanium compounds , analytical chemistry (journal) , germanium , nanotechnology , chemistry , optoelectronics , thermodynamics , chromatography , physics , organic chemistry , layer (electronics) , silicon , computer science , embedded system
Zn-doped Ge2Sb2Te5 phase-change materials have been investigated for phase change memory applications. Zn15.16(Ge2Sb2Te5)84.84 phase change film exhibits a higher crystallization temperature (∼258 °C), wider band gap (∼0.78 eV), better data retention of 10 years at 167.5 °C, higher crystalline resistance, and faster crystallization speed compared with the conventional Ge2Sb2Te5. The proper Zn atom added into Ge2Sb2Te5 serves as a center for suppression of the face-centered-cubic (fcc) phase to hexagonal close-packed (hcp) phase transition, and fcc phase has high thermal stability partially due to the bond recombination among Zn, Sb, and Te atoms.
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