Cascaded field enhancement in plasmon resonant dimer nanoantennas compatible with two-dimensional nanofabrication methods
Author(s) -
Seyfollah Toroghi,
Pieter G. Kik
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4733329
Subject(s) - nanolithography , plasmon , lithography , polarizability , electron beam lithography , nanophotonics , surface plasmon resonance , materials science , nanosphere lithography , field (mathematics) , resonance (particle physics) , dimer , optics , nanotechnology , optoelectronics , nanoparticle , chemistry , physics , fabrication , atomic physics , nuclear magnetic resonance , resist , medicine , alternative medicine , mathematics , pathology , pure mathematics , organic chemistry , layer (electronics) , molecule
Cascaded field enhancement is demonstrated in asymmetric plasmon resonant dimer nanoantennas consisting of shape-tuned ellipsoidal nanoparticles. The nanoparticles that make up the dimer have identical thickness, suggesting that the presented approach can be used to design cascaded dimer antennas compatible with standard two-dimensional top-down nanofabrication tools such as electron beam lithography and nano-imprint lithography. Cascaded excitation is achieved by modification of the in-plane particle aspect ratios in a way that keeps the resonance frequency of the individual particles fixed while significantly changing their polarizability. The achievable field enhancement is evaluated as a function of the particle volume ratio and spacing.
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