Open AccessPattern-integrated interference lithography instrumentation
Author(s) -
Guy M. Burrow,
Matthieu C. R. Leibovici,
Joseph W. Kummer,
Thomas K. Gaylord
Publication year - 2012
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.4729666
Subject(s) - lithography , interference (communication) , interference lithography , metamaterial , integrated circuit , stencil lithography , photolithography , photonics , maskless lithography , photonic integrated circuit , optics , materials science , computer science , x ray lithography , optoelectronics , electron beam lithography , resist , nanotechnology , physics , fabrication , telecommunications , medicine , channel (broadcasting) , alternative medicine , pathology , layer (electronics)
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