z-logo
open-access-imgOpen Access
Response to “Comment on ‘Intrinsic point defect incorporation in silicon single crystals grown from a melt, revisited’” [J. Appl. Phys. 111, 116102 (2012)]
Author(s) -
Jan Vanhellemont
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4729525
Subject(s) - crystallographic defect , silicon , condensed matter physics , materials science , point (geometry) , crystallography , chemistry , physics , optoelectronics , mathematics , geometry

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom