Open AccessSurface passivation of c-Si by atmospheric pressure chemical vapor deposition of Al2O3
Author(s) -
Lachlan E. Black,
Keith R. McIntosh
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4718596
Subject(s) - passivation , annealing (glass) , chemical vapor deposition , materials science , atmospheric pressure , silicon , deposition (geology) , dielectric , permittivity , analytical chemistry (journal) , plasma enhanced chemical vapor deposition , refractive index , chemistry , composite material , nanotechnology , optoelectronics , layer (electronics) , organic chemistry , paleontology , oceanography , sediment , biology , geology
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