Open AccessReview of vacuum systems for X-ray lithography light sources
Author(s) -
J. C. Schuchman
Publication year - 1991
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.41122
Subject(s) - lithography , superconducting magnet , magnet , mechanical engineering , computer science , vacuum chamber , materials science , electrical engineering , optoelectronics , engineering , aerospace engineering
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