Open AccessStructural and electronic differences between deuterated and hydrogenated amorphous silicon
Author(s) -
An Shih,
Jiun-Lin Yeh,
SiChen Lee,
T. Yang
Publication year - 2000
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.373872
Subject(s) - deuterium , silicon , amorphous silicon , amorphous solid , analytical chemistry (journal) , chemical vapor deposition , materials science , hydrogen , plasma enhanced chemical vapor deposition , photoluminescence , ion , plasma , crystalline silicon , chemistry , crystallography , atomic physics , nanotechnology , organic chemistry , optoelectronics , physics , quantum mechanics
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