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Strain in wet thermally oxidized square and circular mesas
Author(s) -
A. C. Alonzo,
Cheng Xu,
T. C. McGill
Publication year - 2000
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.373108
Subject(s) - raman spectroscopy , semiconductor , materials science , orientation (vector space) , strain (injury) , square (algebra) , optical microscope , oxidation process , spectroscopy , crystallography , scanning electron microscope , optics , optoelectronics , geometry , chemistry , composite material , physics , chemical engineering , mathematics , anatomy , medicine , quantum mechanics , engineering
In this paper, we report the observation, through optical microscopy, of drumhead-like patterns in square and circular mesas which have been wet thermally oxidized to completion. Micro-Raman spectroscopy measurements are used to show that these patterns roughly correspond to variations in strain induced in surrounding semiconductor layers by the oxidation process. In addition, the patterns have a specific orientation with respect to the crystallographic axes of the semiconductor. A crystallographic dependence of the oxidation process itself is demonstrated and used to explain the orientation of the drumhead patterns.

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