Thermal boundary resistance at silicon-silica interfaces by molecular dynamics simulations | Zendy

E. Lampin | Zendy; Quang-Hai Nguyen | Zendy; Pierre-Arnaud Francioso | Zendy; Fabrizio Cleri | Zendy

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Thermal boundary resistance at silicon-silica interfaces by molecular dynamics simulations

Author(s) -

E. Lampin,

Quang-Hai Nguyen,

Pierre-Arnaud Francioso,

Fabrizio Cleri

Publication year - 2012

Publication title -

applied physics letters

Language(s) - Uncategorized

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.3698325

Subject(s) - interfacial thermal resistance , molecular dynamics , amorphous solid , materials science , silicon , temperature jump , thermal , relaxation (psychology) , crystalline silicon , thermal resistance , chemical physics , heat transfer , amorphous silicon , amorphous silica , heat flux , boundary (topology) , thermodynamics , chemical engineering , crystallography , chemistry , computational chemistry , physics , optoelectronics , mathematics , mathematical analysis , engineering , psychology , social psychology

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