Open AccessConnection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation
Author(s) -
O. Vetterl,
P. Hapke,
Lothar Houben,
F. Finger,
R. Carius,
H. Wagner
Publication year - 1999
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.369616
Subject(s) - etching (microfabrication) , layer (electronics) , hydrogen , plasma , microcrystalline , materials science , amorphous solid , excitation , plasma etching , analytical chemistry (journal) , volume fraction , phase (matter) , chemistry , composite material , crystallography , chromatography , physics , organic chemistry , quantum mechanics , engineering , electrical engineering
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