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Effects of P implantation and post-implantation annealing on defect formation in ZnO
Author(s) -
Xingjun Wang,
Weimin Chen,
F. Ren,
S. J. Pearton,
I. A. Buyanova
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3687919
Subject(s) - annealing (glass) , photoluminescence , ion implantation , recombination , acceptor , materials science , zinc , doping , ion , optoelectronics , analytical chemistry (journal) , chemistry , condensed matter physics , metallurgy , organic chemistry , biochemistry , physics , chromatography , gene
Photoluminescence (PL) and optically detected magnetic resonance (ODMR) techniques are utilized to examine the effects of P implantation and post-implantation annealing on defect formation in ZnO single crystals. From ODMR, the main defects created by ion implantation include oxygen and zinc vacancies as a well as a deep donor labeled as PD. The formation of the PD defect is likely promoted by the presence of P as it could only be detected in the P-containing ZnO. The V-O and PD centers are found to exhibit low thermal stability and can be annealed out at 800 degrees C. On the other hand, a new set of defects, such as Z, T, and D* centers, is detected after annealing. Based on measured spectral dependences of the ODMR signals, the V-O, V-Zn, and PD centers are shown to participate in spin-dependent recombination processes related to red emissions, whereas the Z, T, and D* centers are involved in radiative recombination over a wide spectral range of 1.55-2.5 eV. From the PL measurements, combined effects of implantation and annealing also lead to appearance of a new PL band peaking at similar to 3.156 eV, likely due to donor-acceptor-pair recombination. The formation of the involved deep acceptor is concluded to be facilitated by the presence of P.

Funding Agencies|Swedish Research Council|621-2010-3971|National Basic Research Program of China|2011CB925604|

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