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Properties of InxGa1−xN films in terahertz range
Author(s) -
A. Gauthier-Brun,
Jinghua Teng,
El Hadj Dogheche,
W. Liu,
Anisha Gokarna,
Masayoshi Tonouchi,
S. J. Chua,
D. Décoster
Publication year - 2012
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3684836
Subject(s) - terahertz radiation , materials science , chemical vapor deposition , refractive index , terahertz spectroscopy and technology , indium , optoelectronics , thin film , characterization (materials science) , spectroscopy , metalorganic vapour phase epitaxy , deposition (geology) , electron mobility , analytical chemistry (journal) , wide bandgap semiconductor , chemistry , nanotechnology , layer (electronics) , physics , paleontology , epitaxy , quantum mechanics , chromatography , sediment , biology

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