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Observation and simulation of hard x ray photoelectron diffraction to determine polarity of polycrystalline zinc oxide films with rotation domains
Author(s) -
Jesse Williams,
Igor Píš,
Masaaki Kobata,
Aimo Winkelmann,
T. Matsushita,
Yutaka Adachi,
Naoki Ohashi,
Keisuke Kobayashi
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3682088
Subject(s) - crystallite , polarity (international relations) , diffraction , photoelectric effect , zinc , materials science , crystallography , oxide , x ray photoelectron spectroscopy , single crystal , chemistry , molecular physics , optics , physics , optoelectronics , nuclear magnetic resonance , biochemistry , metallurgy , cell
X ray photoelectron diffraction (XPD) patterns of polar zinc oxide (ZnO) surfaces were investigated experimentally using hard x rays and monochromatized Cr Kα radiation and theoretically using a cluster model approach and a dynamical Bloch wave approach. We focused on photoelectrons emitted from the Zn 2p3/2 and O 1s orbitals in the analysis. The obtained XPD patterns for the (0001) and (0001¯) surfaces of a ZnO single crystal were distinct for a given emitter and polarity. Polarity determination of c-axis-textured polycrystalline ZnO thin films was also achieved with the concept of XPD, even though the in-plane orientation of the columnar ZnO grains was random.

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