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Hexagonal-based pyramid void defects in GaN and InGaN
Author(s) -
Andrew B. Yankovich,
A. Kvit,
X. Li,
F. Zhang,
V. Avrutin,
H. Y. Liu,
N. Izyumskaya,
Ümit Özgür,
H. Morkoç̌,
Paul M. Voyles
Publication year - 2012
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3679540
Subject(s) - void (composites) , materials science , chemical vapor deposition , hexagonal crystal system , scanning transmission electron microscopy , dislocation , transmission electron microscopy , crystallography , pyramid (geometry) , vacancy defect , gallium nitride , condensed matter physics , optoelectronics , nanotechnology , optics , composite material , chemistry , physics , layer (electronics)
We report a void defect in gallium nitride (GaN) and InGaN, revealed by aberration-corrected scanning transmission electron microscopy (STEM). The voids are pyramids with symmetric hexagonal {0001} base facets and {101¯1} side facets. Each pyramid void has a dislocation at the peak of the pyramid, which continues up along the [0001] growth direction to the surface. Some of the dislocations are hexagonal open core screw dislocations with {101¯0} side facets, varying lateral widths, and varying degrees of hexagonal symmetry. STEM electron energy loss spectroscopy spectrum imaging showed a large C concentration inside the void and on the void surfaces. There is also a larger C concentration in the GaN (or InGaN) below the void than above the void. We propose that inadvertent carbon deposition during metal organic chemical vapor deposition growth acts as a mask, stopping the GaN deposition locally, which in combination with lateral overgrowth, creates a void. Subsequent layers of GaN deposited around the C co...

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