Nanoindentation of high-aspect ratio pillar structures on optical multilayer dielectric diffraction gratings
Author(s) -
Karan Mehrotra,
H.P. Howard,
S. D. Jacobs,
John C. Lambropoulos
Publication year - 2011
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.3673070
Subject(s) - nanoindentation , materials science , dielectric , diffraction , indentation , yield (engineering) , pillar , stress (linguistics) , aspect ratio (aeronautics) , composite material , transverse plane , optics , optoelectronics , structural engineering , linguistics , philosophy , physics , engineering
The mechanical response of optical multilayer dielectric (MLD) diffraction gratings has been studied using nanoindentation. The results are interpreted using a stress-strain model, which reveals a uniaxial yield stress of 4.1 GPa. It is shown that the indentation response of the high-aspect ratio “pillar” geometry (constrained in one transverse direction but free in the other) can be expressed in terms of yield stress rather than material hardness
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