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Anodic-oxide-induced interdiffusion in GaAs/AlGaAs quantum wells
Author(s) -
Shu Yuan,
Yong Yook Kim,
Hark Hoe Tan,
C. Jagadish,
P. T. Burke,
Lap Van Dao,
M. Ga�l,
Michael Chan,
E. H. Li,
Jin Zou,
D. Q. Cai,
D. J. H. Cockayne,
R. M. Cohen
Publication year - 1998
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.366830
Subject(s) - quantum well , photoluminescence , materials science , transmission electron microscopy , oxide , condensed matter physics , anode , gallium arsenide , optoelectronics , chemistry , nanotechnology , metallurgy , optics , physics , electrode , laser
Enhancement of interdiffusion in GaAs/AlGaAs quantum wells due to anodic oxides was studied. Photoluminescence, transmission electron microscopy, and quantum well modeling were used to understand the effects of intermixing on the quantum well shape. Residual water in the oxide was found to increase the intermixing, though it was not the prime cause for intermixing. Injection of defects such as group III vacancies or interstitials was considered to be a driving force for the intermixing. Different current densities used in the experimental range to create anodic oxides had little effect on the intermixing. ©1998 American Institute of Physics.published_or_final_versio

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