Open AccessDirect and indirect excitation of Nd3+ ions sensitized by Si nanocrystals embedded in a SiO2 thin film
Author(s) -
Émilie Steveler,
H. Rinnert,
M. Vergnat
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3667286
Subject(s) - photoluminescence , excitation , luminescence , ion , materials science , exciton , nanocrystal , silicon , photoluminescence excitation , analytical chemistry (journal) , doping , absorption (acoustics) , thin film , absorption spectroscopy , atomic physics , optoelectronics , chemistry , nanotechnology , optics , condensed matter physics , physics , organic chemistry , chromatography , composite material , electrical engineering , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom