A study of the impact of dislocations on the thermoelectric properties of quantum wells in the Si/SiGe materials system
Author(s) -
J.R. Watling,
Douglas J. Paul
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3665127
Subject(s) - thermoelectric effect , condensed matter physics , materials science , seebeck coefficient , thermal conductivity , scattering , semiconductor , dislocation , thermoelectric materials , electrical resistivity and conductivity , optoelectronics , optics , composite material , physics , thermodynamics , quantum mechanics
Thermoelectric materials generate electricity from thermal energy using the Seebeck effect to generate a voltage and an electronic current from a temperature difference across the semiconductor. High thermoelectric efficiency ZT requires a semiconductor with high electronic conductivity and low thermal conductivity. Here, we investigate the effect of scattering from threading dislocations of edge character on the thermoelectric performance of individual n and p-channel SiGe multiple quantum well structures. Our detailed physical simulations indicate that while the thermal and electrical conductivities decrease with increasing dislocation scattering/density, the Seebeck coefficient actually increases with increasing threading dislocation density above 106 cm−2 at room temperature, due to an increase in the entropy associated with each carrier. The collective result of these individual effects, is that the present Si-based quantum well designs can tolerate scattering by a threading dislocation density up to...
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom