z-logo
open-access-imgOpen Access
Investigation of the negative differential resistance reproducibility in AlN/GaN double-barrier resonant tunnelling diodes
Author(s) -
Mohamed Seghir Boucherit,
A. Soltani,
E. Monroy,
Michel Rousseau,
D. Deresmes,
Maxime Berthe,
Corentin Durand,
J.C. De Jaeger
Publication year - 2011
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3659468
Subject(s) - quantum tunnelling , diode , sapphire , molecular beam epitaxy , optoelectronics , materials science , breakdown voltage , reproducibility , wide bandgap semiconductor , voltage , current (fluid) , peak current , contact resistance , epitaxy , chemistry , optics , nanotechnology , electrical engineering , layer (electronics) , electrode , physics , laser , chromatography , engineering , electrochemistry

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom