Joint Research on Scatterometry and AFM Wafer Metrology | Zendy

Bernd Bodermann | Zendy; Egbert Buhr | Zendy; HansUlrich Danzebrink | Zendy; Markus Bär | Zendy; Frank Scholze | Zendy; Michael Krumrey | Zendy; M. Wurm | Zendy; Petr Klapetek | Zendy; PoulErik Hansen | Zendy; Virpi Korpelainen | Zendy; Marijn van Veghel | Zendy; Andrew Yacoot | Zendy; Samuli Siitonen | Zendy; Omar El Gawhary | Zendy; Sven Burger | Zendy; Toni Saastamoinen | Zendy; David G. Seiler | Zendy; Alain C. Diebold | Zendy; Robert McDonald | Zendy; Amal Chabli | Zendy; Erik M. Secula | Zendy

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Joint Research on Scatterometry and AFM Wafer Metrology

Author(s) -

Bernd Bodermann,

Egbert Buhr,

HansUlrich Danzebrink,

Markus Bär,

Frank Scholze,

Michael Krumrey,

M. Wurm,

Petr Klapetek,

PoulErik Hansen,

Virpi Korpelainen,

Marijn van Veghel,

Andrew Yacoot,

Samuli Siitonen,

Omar El Gawhary,

Sven Burger,

Toni Saastamoinen,

David G. Seiler,

Alain C. Diebold,

Robert McDonald,

Amal Chabli,

Erik M. Secula

Publication year - 2011

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.3657910

Subject(s) - icon , citation , publishing , computer science , information retrieval , filter (signal processing) , wafer , download , computer graphics (images) , world wide web , library science , art history , art , engineering , literature , computer vision , programming language , electrical engineering

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers

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