Temperature dependent photoluminescence of lateral polarity junctions of metal organic chemical vapor deposition grown GaN
Author(s) -
Ronny Kirste,
Ramón Collazo,
Gordon Callsen,
Markus R. Wagner,
Thomas Kure,
J. S. Reparaz,
Seji Mita,
Jinqiao Xie,
A.L. Rice,
James Tweedie,
Zlatko Sitar,
A. Hoffmann
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3656987
Subject(s) - photoluminescence , materials science , metalorganic vapour phase epitaxy , chemical vapor deposition , sapphire , luminescence , optoelectronics , wide bandgap semiconductor , raman spectroscopy , molecular physics , epitaxy , chemistry , optics , layer (electronics) , laser , nanotechnology , physics
We report on fundamental structural and optical properties of lateral polarity junctions in GaN. GaN with Ga- to N-polar junctions was grown on sapphire using an AlN buffer layer. Results from scanning electron microscopy and Raman spectroscopy measurements indicate a superior quality of the Ga-polar GaN. An extremely strong luminescence signal is observed at the inversion domain boundary (IDB). Temperature dependent micro photoluminescence measurements are used to reveal the recombination processes underlying this strong emission. At 5 K the emission mainly arises from a stripe along the inversion domain boundary with a thickness of 4-5 μm. An increase of the temperature initially leads to a narrowing to below 2 μm emission area width followed by a broadening at temperatures above 70 K. The relatively broad emission area at low temperatures is explained by a diagonal IDB. It is shown that all further changes in the emission area width are related to thermalization effects of carriers and defects attracte...
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