Erratum: “Ferromagnetism in antiferromagnetic NiO-based thin films” [J. Appl. Phys. 110, 043921 (2011)]
Author(s) -
Yuanhua Lin,
Bin Zhan,
CeWen Nan,
Rongjuan Zhao,
Xiang Xu,
Masaki Kobayashi
Publication year - 2011
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.3656440
Subject(s) - antiferromagnetism , ferromagnetism , condensed matter physics , non blocking i/o , materials science , thin film , physics , nanotechnology , chemistry , biochemistry , catalysis
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