z-logo
open-access-imgOpen Access
Mechanisms of suppressing secondary nucleation for low-power and low-temperature microwave plasma self-bias-enhanced growth of diamond films in argon diluted methane
Author(s) -
Ji-heng Jiang,
Yonhua Tzeng
Publication year - 2011
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.3656241
Subject(s) - diamond , nucleation , chemical vapor deposition , materials science , argon , material properties of diamond , ion source , analytical chemistry (journal) , chemistry , ion , nanotechnology , composite material , organic chemistry , chromatography
We report on mechanisms for suppressing diamond secondary nucleation in microwave plasma self-bias-enhanced growth (SBEG) of diamond films in methane diluted by argon. High-density plasma at a small distance from the substrate induces a floating potential which promotes high-flux, low-energy ion bombardment on diamond growing surfaces along with an equal flux of electrons. Increased atomic hydrogen generated by electron impact dissociation of methane and low-energy ion bombardment help remove hydrocarbon coatings on diamond grains in favor of continuous grain growth and, therefore, the suppression of secondary diamond nucleation. Energetic meta-stable excited argon, abundant C2 dimers, and enhanced effective surface temperature due to low-energy ion bombardment further promote the diamond grain growth resulting in the deposition of a diamond film with columnar diamond grains of much larger grain sizes and a much lower density of grain boundaries than ultrananocrystalline diamond (UNCD) films grown under similar conditions without optimized plasma-substrate interactions. SEM, XRD, PL, and Raman scattering help confirm the deposition of diamond films with columnar grains

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom