Open AccessSymmetric and anti-symmetric magnetic resonances in double-triangle nanoparticle arrays fabricated via angle-resolved nanosphere lithography
Author(s) -
Jian Pan,
Zhuo Chen,
Zhendong Yan,
Zhishen Cao,
Peng Zhan,
Nai-Ben Ming,
Zhenlin Wang
Publication year - 2011
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.3655439
Subject(s) - nanosphere lithography , excited state , planar , nanoparticle , magnetic field , electric field , materials science , symmetry (geometry) , lithography , molecular physics , electron beam lithography , optics , condensed matter physics , optoelectronics , physics , atomic physics , nanotechnology , resist , quantum mechanics , medicine , alternative medicine , computer graphics (images) , geometry , mathematics , pathology , fabrication , layer (electronics) , computer science
We report experimentally that for a particular high-symmetry planar periodic arrangement of metal double-triangle nanoparticle arrays fabricated via angle resolved nanosphere lithography, both anti-symmetric and symmetric magnetic resonances can be explicitly excited at off-normal incidence. Further, we demonstrate that the underlying mechanism for the formation of these two modes is a result of direct interactions with the incident electric and magnetic fields, respectively. As a consequence, with increasing the incident angle there is a relatively small blue-shift in the transmission for the electric-field induced anti-symmetric mode, while a remarkable red-shift is observed for the magnetic-field induced symmetric mode
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