Structure of the InAlAs/InP interface by atomically resolved energy dispersive spectroscopy
Author(s) -
Dmitri O. Klenov,
Joshua M. O. Zide
Publication year - 2011
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.3645632
Subject(s) - monolayer , epitaxy , spectroscopy , transmission electron microscopy , materials science , surface energy , electron energy loss spectroscopy , scanning transmission electron microscopy , crystallography , analytical chemistry (journal) , condensed matter physics , chemistry , layer (electronics) , nanotechnology , physics , quantum mechanics , chromatography , composite material
Final published versionThe structure of epitaxially grown InAlAs/InP interfaces was studied using atomically resolved
x-ray energy dispersive spectroscopy in scanning transmission electron microscopy. As and P
sublattices show sharp termination on the interface. The In sublattice is continuous across the
interface. The study has shown the depletion of the Al concentration at the interface; at the last
atomic columns of the InAlAs, In occupancy is close to 100%, while Al occupancy is almost zero.
A monolayer of InAs at the interface is consistent with substitution of As for P at the surface
preceding growth.University of Delaware. Department of Materials Science and Engineering
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